Fabrication and photosensitivity of ZnO/CdS/silica nanopillars based photoresistor
نویسندگان
چکیده
A kind of Zinc oxide (ZnO)/Cadmium sulfide (CdS)/Silica nanopillars structure is fabricated to photoresistor for the first time. The silica wafer with countless used as substrate photoresistor. CdS and ZnO film are deposited by frequency (RF) magnetron sputtering onto surface form ZnO/CdS/Silica structure. nanowires also can grow on hydrothermal reaction nanowires/CdS/Silica structures. X-ray diffraction curves show that both planar nanopillar well-crystallized. deposition reduce reflection increase absorption incoming light, especially light a wavelength less than 350 nm. And ZnO/CdS heterojunction retard recombination probability photon-generated carries prolong lifetime carriers, which lending remarkable photocurrent improvement. photosensitivity property testing results has best response 135 white 10 mW/cm2 illumination.
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ژورنال
عنوان ژورنال: Journal of Materials Science: Materials in Electronics
سال: 2021
ISSN: ['1573-482X', '0957-4522']
DOI: https://doi.org/10.1007/s10854-021-05804-x